LASER ANNEALING OF COPPER AND SILICON THIN-FILMS

被引：3

作者：

BLOCH, J

ZEIRI, Y

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574509

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1831 / 1835

页数：5

共 9 条

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[7]

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[9] METAL REFLECTIVITY UNDER HIGH-INTENSITY OPTICAL RADIATION [J].

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