PHOTOEMISSION-STUDY OF THE ZNSE/GAAS (100) INTERFACE - COMPOSITION AND BAND OFFSET

被引:7
作者
COLBOW, KM
GAO, Y
TIEDJE, T
DAHN, JR
EBERHARDT, W
机构
[1] SIMON FRASER UNIV, DEPT PHYS, BURNABY V5A 1S6, BC, CANADA
[2] FORSCHUNGSZENTRUM JULICH, W-5170 JULICH 1, GERMANY
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1991年 / 9卷 / 05期
关键词
D O I
10.1116/1.577214
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The interface between ZnSe and GaAs (100) has been studied as a function of annealing temperature by high-resolution photoemission spectroscopy using synchrotron radiation. From an analysis of chemical shifts and relative intensities of the atomic core levels, we find an interfacial Ga2Se3 layer forms with loss of Zn and As at the interface. The valence band offset between ZnSe and GaAs is found to be 1.25 +/- 0.07 eV, from photoemission measurements of the top of the valence band.
引用
收藏
页码:2614 / 2617
页数:4
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