QUANTITATIVE ASSESSMENT OF BE ACCEPTORS IN GAAS BY LOCAL VIBRATIONAL-MODE SPECTROSCOPY

被引:24
作者
WAGNER, J
MAIER, M
MURRAY, R
NEWMAN, RC
BEALL, RB
HARRIS, JJ
机构
[1] UNIV LONDON IMPERIAL COLL SCI & TECHNOL,BLACKETT LAB,INTERDISCIPLINARY RES CTR,LONDON SW7 2BZ,ENGLAND
[2] PHILIPS RES LABS,REDHILL RH1 5HA,SURREY,ENGLAND
关键词
D O I
10.1063/1.347289
中图分类号
O59 [应用物理学];
学科分类号
摘要
Be-doped epitaxial layers of GaAs grown by molecular beam epitaxy have been studied by local vibrational mode spectroscopy combining infrared absorption and Raman scattering. Calibration factors for both experimental techniques have been derived which enable quantitative assessments to be made of the concentrations of Be acceptors in GaAs. In Raman spectroscopy the detection limit is almost-equal-to 3 x 10(18) cm-3 for as-grown layers only 10 nm in thickness.
引用
收藏
页码:971 / 974
页数:4
相关论文
共 20 条
[11]   THE PASSIVATION OF BE ACCEPTORS IN GAAS BY EXPOSURE TO A HYDROGEN PLASMA [J].
NANDHRA, PS ;
NEWMAN, RC ;
MURRAY, R ;
PAJOT, B ;
CHEVALLIER, J ;
BEALL, RB ;
HARRIS, JJ .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1988, 3 (04) :356-360
[12]  
NEWMAN RC, 1973, INFRARED STUDIES CRY
[13]  
NEWMAN RC, 1985, MAT RES S P, V46, P459
[14]   RAMAN-SCATTERING BY COUPLED LO-PHONON PLASMON MODES AND FORBIDDEN TO-PHONON RAMAN-SCATTERING IN HEAVILY DOPED P-TYPE GAAS [J].
OLEGO, D ;
CARDONA, M .
PHYSICAL REVIEW B, 1981, 24 (12) :7217-7232
[15]   SELF-ENERGY EFFECTS OF THE OPTICAL PHONONS OF HEAVILY DOPED P-GAAS AND P-GE [J].
OLEGO, D ;
CARDONA, M .
PHYSICAL REVIEW B, 1981, 23 (12) :6592-6602
[16]   RESONANCE RAMAN-SCATTERING OF SI LOCAL VIBRATIONAL-MODES IN GAAS [J].
RAMSTEINER, M ;
WAGNER, J ;
ENNEN, H ;
MAIER, M .
PHYSICAL REVIEW B, 1988, 38 (15) :10669-10676
[17]  
SZE SM, 1981, PHYSICS SEMICONDUCTO
[18]   RESONANT RAMAN-SCATTERING IN GAAS [J].
TROMMER, R ;
CARDONA, M .
PHYSICAL REVIEW B, 1978, 17 (04) :1865-1876
[19]   RAMAN-SPECTROSCOPIC ASSESSMENT OF SI AND BE LOCAL VIBRATIONAL-MODES IN GAAS-LAYERS GROWN BY MOLECULAR-BEAM EPITAXY [J].
WAGNER, J ;
RAMSTEINER, M .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1989, 25 (05) :993-996
[20]  
Wagner J., 1989, Materials Science Forum, V38-41, P815, DOI 10.4028/www.scientific.net/MSF.38-41.815