CRITICAL CURRENT-DENSITY AND MICROSTRUCTURE OF YBA2CU3O7 THIN-FILMS POSTANNEALED AT A LOW OXYGEN PARTIAL-PRESSURE

被引：4

作者：

MOGROCAMPERO, A

TURNER, LG

HALL, EL

机构：

[1] GE Research and Development Center, Schenectady, 12301, New York

来源：

JOURNAL OF SUPERCONDUCTIVITY | 1992年 / 5卷 / 02期

关键词：

SUPERCONDUCTING FILMS; YBA2CU3O7; CRITICAL CURRENT DENSITY; MICROSTRUCTURE;

D O I：

10.1007/BF00618058

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Post-annealing of thin films of YBa2Cu3O7 (YBCO) has been performed at 29 Pa and 750-degrees-C. For films 0.6 mum thick, a critical current density > 1 MA cm-2 is obtained at 77 K, with a sharp eddy current response at 25 MHz. Microstructural investigation of these films by cross-sectional and planar transmission electron microscopy reveals that the YBCO film has the c-axis normal to the plane of the substrate in a continuous sheet of varying thickness, frequently covering the entire thickness of the film. Mutually perpendicular rods with the c-axis in the plane of the LaAlO3 substrate are also seen. The microstructure and critical current density of these films are compared with those of previously reported films post-annealed in atmospheric-pressure oxygen.

引用

页码：143 / 147

页数：5

共 7 条

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