X-RAY DOUBLE AND TRIPLE-CRYSTAL DIFFRACTOMETRY OF MOSAIC STRUCTURE IN HETEROEPITAXIAL LAYERS

被引:86
作者
HOLY, V
KUBENA, J
ABRAMOF, E
LISCHKA, K
PESEK, A
KOPPENSTEINER, E
机构
[1] KEPLER UNIV, INST OPTOELECTRON, A-4040 LINZ, AUSTRIA
[2] KEPLER UNIV, INST SEMICOND PHYS, A-4040 LINZ, AUSTRIA
[3] INST PESQUISAS ESPACIAIS, BR-12201 SAO JOSE DOS CAMPOS, SP, BRAZIL
关键词
D O I
10.1063/1.354828
中图分类号
O59 [应用物理学];
学科分类号
摘要
X-ray diffraction in thin layers containing small randomly placed defects is described by means of the kinematical diffraction theory and optical coherence formalism. The method enables us to calculate both the diffracted intensity and its angular distribution, so that it can be used for simulating double crystal and triple crystal x-ray diffractometry experiments. The theory has been applied to experimental data obtained from diffractometry measurements of an epitaxial ZnTe layer with mosaic structure after several steps of chemical thinning. A good agreement of the theory with experiments has been achieved.
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页码:1736 / 1743
页数:8
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