EFFECTS OF A STAIRCASE ON MINIGAPS IN SI INVERSION-LAYERS

被引：3

作者：

OHKAWA, FJ ^{[1
]}

机构：

[1] UNIV CALIF SAN DIEGO,DEPT PHYS,LA JOLLA,CA 92093

来源：

PHYSICAL REVIEW B | 1981年 / 24卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.24.7297

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：7297 / 7303

页数：7

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