ANNEALING EFFECT ON LATTICE DISTORTION IN ANODIZED POROUS SILICON LAYERS

被引:37
作者
SUGIYAMA, H
NITTONO, O
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1989年 / 28卷 / 11期
关键词
D O I
10.1143/JJAP.28.L2013
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L2013 / L2016
页数:4
相关论文
共 9 条
  • [1] DETERMINATION OF LATTICE-PARAMETER AND ELASTIC PROPERTIES OF POROUS SILICON BY X-RAY-DIFFRACTION
    BARLA, K
    HERINO, R
    BOMCHIL, G
    PFISTER, JC
    FREUND, A
    [J]. JOURNAL OF CRYSTAL GROWTH, 1984, 68 (03) : 727 - 732
  • [2] X-RAY TOPOGRAPHIC CHARACTERIZATION OF POROUS SILICON LAYERS
    BARLA, K
    BOMCHIL, G
    HERINO, R
    PFISTER, JC
    BARUCHEL, J
    [J]. JOURNAL OF CRYSTAL GROWTH, 1984, 68 (03) : 721 - 726
  • [3] MICROSTRUCTURE AND FORMATION MECHANISM OF POROUS SILICON
    BEALE, MIJ
    CHEW, NG
    UREN, MJ
    CULLIS, AG
    BENJAMIN, JD
    [J]. APPLIED PHYSICS LETTERS, 1985, 46 (01) : 86 - 88
  • [4] Herino R., 1984, Materials Letters, V2, P519, DOI 10.1016/0167-577X(84)90086-7
  • [5] ITO I, 1988, STRUCTURE SURFACES, V2, P378
  • [6] INITIAL OXIDATION PROCESS OF ANODIZED POROUS SILICON WITH HYDROGEN-ATOMS CHEMISORBED ON THE INNER SURFACE
    KATO, Y
    ITO, T
    HIRAKI, A
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (08): : L1406 - L1409
  • [7] HIGH-TEMPERATURE TREATMENT OF POROUS SILICON
    LABUNOV, VA
    BONDARENKO, VP
    BORISENKO, VE
    DOROFEEV, AM
    [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1987, 102 (01): : 193 - 198
  • [8] CHARACTERIZATION OF POROUS SILICON LAYERS BY MEANS OF X-RAY DOUBLE-CRYSTAL DIFFRACTOMETRY
    SUGIYAMA, H
    NITTONO, O
    [J]. ISIJ INTERNATIONAL, 1989, 29 (03) : 223 - 228
  • [9] X-RAY DOUBLE CRYSTAL DIFFRACTION STUDY OF POROUS SILICON
    YOUNG, IM
    BEALE, MIJ
    BENJAMIN, JD
    [J]. APPLIED PHYSICS LETTERS, 1985, 46 (12) : 1133 - 1135