A SIMPLE AND NEW MODIFIED CVD TECHNIQUE FOR FABRICATION OF SNO2 FILMS

被引：14

作者：

VLAHOVIC, B

PERSIN, M

机构：

[1] Ruder BoSkoviC Institute, Zagreb, 41001

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1990年 / 23卷 / 10期

关键词：

D O I：

10.1088/0022-3727/23/10/010

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin polycrystalline films of tin dioxide, SnO2, were prepared by a new modification of the chemical vapour deposition (CVD) method. Some electrical and optical properties of SnO2films were determined as a function of the deposition conditions and doping by antimony (Sb). Attempts have been made to find the optimum deposition parameters which give SnO2films with good optoelectronic properties, high electrical conductivity, large IR reflectance and at the same time high optical transmittance in the visible region. © 1990 IOP Publishing Ltd.

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页码：1324 / 1326

页数：3

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