RAMAN CHARACTERIZATION OF HYDROXYL IN FUSED-SILICA AND THERMALLY GROWN SIO2

被引:23
作者
MIKKELSEN, JC
GALEENER, FL
MOSBY, WJ
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关键词
D O I
10.1007/BF02660125
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:631 / 651
页数:21
相关论文
共 39 条
[1]   HYDRIDES AND HYDROXYLS IN THIN SILICON DIOXIDE FILMS [J].
BECKMANN, KH ;
HARRICK, NJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (04) :614-&
[2]  
BELL T, 1962, PHYS CHEM GLASSES-B, V3, P141
[3]   HYDROGEN PROFILES IN WATER-OXIDIZED SILICON [J].
BREED, DJ ;
DOREMUS, RH .
JOURNAL OF PHYSICAL CHEMISTRY, 1976, 80 (22) :2471-2473
[4]  
Bruckner R., 1970, Journal of Non-Crystalline Solids, V5, P123, DOI 10.1016/0022-3093(70)90190-0
[5]  
Bruckner R, 1970, J NON-CRYST SOLIDS, V5, P177
[6]   TRACER EVALUATION OF HYDROGEN IN STEAM-GROWN SIO2 FILMS [J].
BURKHARD.PJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (2P1) :196-&
[7]  
BURN I, 1970, PHYS CHEM GLASSES, V11, P106
[8]   GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J].
DEAL, BE ;
GROVE, AS .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3770-&
[9]  
Doremus RH., 1973, GLASS SCI
[10]  
Doremus RH., 1969, REACT SOLID, P667