ANALYSIS OF MARKER MOTION IN THIN-FILM SILICIDE FORMATION

被引：32

作者：

TU, KN ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 08期

关键词：

D O I：

10.1063/1.324178

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3379 / 3382

页数：4

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[20] TUNGSTEN AS A MARKER IN THIN-FILM DIFFUSION STUDIES [J].

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