TWO-DIMENSIONAL SIMULATION OF PHOTOLITHOGRAPHY ON REFLECTIVE STEPPED SUBSTRATE

被引：19

作者：

MATSUZAWA, T

MONIWA, A

HASEGAWA, N

SUNAMI, H

机构：

来源：

关键词：

D O I：

10.1109/TCAD.1987.1270291

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：446 / 451

页数：6

共 6 条

[1]

Born M., 1980, PRINCIPLE OPTICS, V6th

[2] MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS [J].

DILL, FH ;

NEUREUTHER, AR ;

TUTTLE, JA ;

WALKER, EJ .

[3] CHARACTERIZATION OF POSITIVE PHOTORESIST [J].

DILL, FH ;

HORNBERGER, WP ;

HAUGE, PS ;

SHAW, JM .

[4]

HAGOUEL PI, 1976, THESIS U CALIFORNIA

[5]

KAGAWA Y, 1983, KAIRYOUIKI MONDAI NO

OLDHAM, WG ;

NANDGAONKAR, SN ;

NEUREUTHER, AR ;

OTOOLE, M .