TRIANGULAR SHAPED BEAM TECHNIQUE IN EB EXPOSURE SYSTEM EX-7 FOR ULSI PATTERN-FORMATION

被引：6

作者：

HATTORI, K

IKENAGA, O

WADA, H

TAMAMUSHI, S

NISHIMURA, E

IKEDA, N

KATOH, Y

KUSAKABE, H

YOSHIKAWA, R

TAKIGAWA, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 10期

关键词：

D O I：

10.1143/JJAP.28.2065

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2065 / 2069

页数：5

共 8 条

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[2]

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[4]

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[5] INTEGRATED DATA CONVERSION FOR THE ELECTRON-BEAM EXPOSURE SYSTEM EX-7 [J].

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[6] THE ELECTRON-BEAM COLUMN FOR A HIGH-DOSE AND HIGH-VOLTAGE ELECTRON-BEAM EXPOSURE SYSTEM EX-7 [J].

TAMAMUSHI, S ;

WADA, H ;

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[7] A HIGH-SPEED EBL COLUMN DESIGNED TO MINIMIZE BEAM INTERACTIONS [J].

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[8] A HIGH-DOSE AND HIGH-ACCURACY VARIABLE SHAPED ELECTRON-BEAM EXPOSURE SYSTEM FOR QUARTERMICRON DEVICE FABRICATION [J].

YOSHIKAWA, R ;

WADA, H ;

GOTO, M ;

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :70-74

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