INTEGRATED DATA CONVERSION FOR THE ELECTRON-BEAM EXPOSURE SYSTEM EX-7

被引：6

作者：

KOYAMA, K ^{[1
]}

IKENAGA, O ^{[1
]}

ABE, T ^{[1
]}

YOSHIKAWA, R ^{[1
]}

TAKIGAWA, T ^{[1
]}

WATANABE, S ^{[1
]}

机构：

[1] TOSHIBA CORP,CTR SEMICOND SYST ENGN,SAIWAI KU,KAWASAKI 210,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584112

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2061 / 2065

页数：5

共 8 条

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DOHERTY, JA ;

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[2] DATA COMPACTION AND VECTOR SCAN E-BEAM SYSTEM PERFORMANCE IMPROVEMENT USING A NOVEL ALGORITHM FOR RECOGNITION OF PATTERN STEP AND REPEATS [J].

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[3] ADVANCED PATTERN DATA-PROCESSING TECHNIQUE FOR A RASTER SCAN ELECTRON-BEAM EXPOSURE SYSTEM [J].

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[4] EBCAD - FULLY INTEGRATED PATTERN DATA-PROCESSING FOR DIRECT WRITE ELECTRON-BEAM LITHOGRAPHY SYSTEMS [J].

OTTO, OW .

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[5]

PATLACH AM, 1987, J VAC SCI TECHNOL, V15, P874

[6]

SAITOH K, 1982, EXTENDED ABSTRACTS E, P479

[7] DATA COMPACTION METHOD FOR RASTER-SCAN EXPOSURE SYSTEM [J].

SUMI, M ;

CHIBA, F ;

NINOMIYA, M .

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[8] A HIGH-DOSE AND HIGH-ACCURACY VARIABLE SHAPED ELECTRON-BEAM EXPOSURE SYSTEM FOR QUARTERMICRON DEVICE FABRICATION [J].

YOSHIKAWA, R ;

WADA, H ;

GOTO, M ;

KUSAKABE, H ;

IKENAGA, O ;

TAMAMUSHI, S ;

NINOMIYA, M ;

TAKIGAWA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :70-74

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