THE ELECTRON-BEAM COLUMN FOR A HIGH-DOSE AND HIGH-VOLTAGE ELECTRON-BEAM EXPOSURE SYSTEM EX-7

被引：4

作者：

TAMAMUSHI, S

WADA, H

OGAWA, Y

SASAKI, I

NAKASUJI, M

KUSAKABE, H

YOSHIKAWA, R

TAKIGAWA, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.584006

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：209 / 212

页数：4

共 11 条

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[8] PATTERN FIDELITY IN SUB-MICRON LITHOGRAPHY WITH A RECTANGULAR ELECTRON-BEAM [J].

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[10]

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