PERFORMANCE OF A SPUTTER ION SOURCE AND ITS APPLICATION FOR IMPLANTED ION PROFILE EXPERIMENTS

被引：1

作者：

BROWN, G

RENTON, ML

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS | 1971年 / 92卷 / 04期

关键词：

D O I：

10.1016/0029-554X(71)90099-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：477 / &

共 6 条

[1] COPELAND JA, 1969, IEEE T ELECTRON DEVI, VED16, P445
[2] USE OF LOW-ENERGY ACCELERATORS FOR ION IMPLANTATION
CRACKNELL, PJ
GETTINGS, M
STEPHENS, KG
[J]. NUCLEAR INSTRUMENTS & METHODS, 1971, 92 (04): : 465 - +
[3] 2-DIRECTIONAL FOCUSING OF CHARGED PARTICLES WITH A SECTOR-SHAPED, UNIFORM MAGNETIC FIELD
CROSS, WG
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1951, 22 (10) : 717 - 722
[4] A SPUTTERING ION SOURCE
HILL, KJ
NELSON, RS
[J]. NUCLEAR INSTRUMENTS & METHODS, 1965, 38 (DEC): : 15 - &
[5] JONSCHER AK, 1960, PRINCIPLES SEMICONDU
[6] LINDHARD J, 1963, KGL DANSKE VIDENSKAB, V33, P2