ETCHING OF ABRADED GERMANIUM SURFACES WITH CP-4 REAGENT

被引：15

作者：

PUGH, EN

SAMUELS, LE

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1962年 / 109卷 / 05期

关键词：

D O I：

10.1149/1.2425433

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：409 / 412

页数：4

共 10 条

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[5]

FAUST JW, 1960, SURFACE CHEM METALS, P130

[6]

FAUST JW, 1957, UNPUB OCT EL SOC M B

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FAUST JW, 1959, SPECIAL TECH PUBL, V246

[8] ELECTRON MICROSCOPE STUDIES ON THE ETCHING OF IRRADIATED GERMANIUM [J].

NOGGLE, TS ;

STIEGLER, JO .

JOURNAL OF APPLIED PHYSICS, 1959, 30 (08) :1279-1288

[9] OBSERVATIONS ON THE DISLOCATION STRUCTURE OF GERMANIUM CRYSTALS [J].

PFANN, WG ;

VOGEL, FL .

ACTA METALLURGICA, 1957, 5 (07) :377-384

[10] A METALLOGRAPHIC INVESTIGATION OF THE DAMAGED LAYER IN ABRADED GERMANIUM SURFACES [J].

PUGH, EN ;

SAMUELS, LE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (11) :1043-1047

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