FURTHER EXAMINATION OF THE SI KLL AUGER LINE IN SILICON-NITRIDE THIN-FILMS

被引：136

作者：

TAYLOR, JA

机构：

来源：

关键词：

D O I：

10.1016/0378-5963(81)90068-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：168 / 184

页数：17

共 32 条

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