AN X-RAY STUDY OF DOMAIN-STRUCTURE AND STRESS IN PD2SI FILMS AT PD-SI INTERFACES

被引：9

作者：

CHEN, H ^{[1
]}

WHITE, GE ^{[1
]}

STOCK, SR ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

THIN SOLID FILMS | 1982年 / 93卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(82)90101-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：161 / 169

页数：9

共 15 条

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