OBSERVATIONS OF STRESSES IN THIN-FILMS OF PALLADIUM AND PLATINUM SILICIDES ON SILICON

被引：33

作者：

ANGILELLO, J

HEURLE, FD

PETERSON, S

SEGMULLER, A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 01期

关键词：

D O I：

10.1116/1.570486

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：471 / 475

页数：5

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