PREPARATION CONDITIONS OF SPUTTERED ELECTROCHROMIC WO3 FILMS AND THEIR INFRARED-ABSORPTION SPECTRA

被引:49
作者
KITAO, M
YAMADA, S
YOSHIDA, S
AKRAM, H
URABE, K
机构
[1] Research Institute of Electronics, Shizuoka University Johoku 3-5-1, 432, Hammatsu
关键词
D O I
10.1016/0927-0248(92)90071-V
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Tungsten oxide films were prepared by rf sputtering in an argon-oxygen atmosphere from W and WO3 targets. To bring about reversible electrochromic (EC) characteristics, as-deposited films require an aging process (i.e. cycles of injection/ejection of charge carriers). The infrared absorption band at around 3300 cm-1 increases during the aging process, and it is assigned as OH stretching vibrations of adsorbed water. By coloration after aging, the 3300 cm-1 band decreases, and a new band appears at 2400 cm-1. The latter band is considered to be due to the stretching mode of OH radicals incorporated in the WO3 matrix. At low coloration levels, the 2400 cm-1 band increases slightly with injected charge, and a coloration mechanism other than the usual double injection model may be considered. The coloration efficiency depends on the preparation conditions. Its maximum value is the same for films prepared from W and WO3 targets, and is 60 cm2/C at a wavelength of 600 nm. When a tungsten target is used, the substrate temperature is low and the deposition rate is high compared with a WO3 target.
引用
收藏
页码:241 / 255
页数:15
相关论文
共 18 条
[1]   PREPARATION AND AGING OF SPUTTERED TUNGSTIC OXIDE-FILMS [J].
AKRAM, H ;
TATSUOKA, H ;
KITAO, M ;
YAMADA, S .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (05) :2039-2043
[2]   ELECTROCHROMIC PROPERTIES OF RF-SPUTTERED TUNGSTIC OXIDE FILM PREPARED FROM A W-METAL TARGET [J].
AKRAM, H ;
KITAO, M ;
YAMADA, S .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (09) :4364-4367
[3]   INFRARED AND RAMAN-STUDY OF WO3 TUNGSTEN TRIOXIDES AND WO3, XH2O TUNGSTEN TRIOXIDE HYDRATES [J].
DANIEL, MF ;
DESBAT, B ;
LASSEGUES, JC ;
GERAND, B ;
FIGLARZ, M .
JOURNAL OF SOLID STATE CHEMISTRY, 1987, 67 (02) :235-247
[4]   INFRARED AND RAMAN SPECTROSCOPIES OF RF SPUTTERED TUNGSTEN-OXIDE FILMS [J].
DANIEL, MF ;
DESBAT, B ;
LASSEGUES, JC ;
GARIE, R .
JOURNAL OF SOLID STATE CHEMISTRY, 1988, 73 (01) :127-139
[5]   TRANSITION-METAL OXIDE ELECTROCHROMIC MATERIALS AND DISPLAYS - A REVIEW .1. OXIDES WITH CATHODIC COLORATION [J].
DAUTREMONTSMITH, WC .
DISPLAYS, 1982, 3 (01) :3-22
[6]   INFLUENCE OF SUBSTOICHIOMETRY, HYDROGEN CONTENT AND CRYSTALLINITY ON OPTICAL AND ELECTRICAL-PROPERTIES OF HXWOY THIN-FILMS [J].
DENEUVILLE, A ;
GERARD, P .
JOURNAL OF ELECTRONIC MATERIALS, 1978, 7 (04) :559-588
[7]  
DIPAOLA A, 1990, J ELECTROCHEM SOC, V40, P487
[8]  
FAUGHNAN BW, 1975, RCA REV, V36, P177
[9]   CHARACTERIZATION OF A WO3 THIN-FILMS BEFORE AND AFTER COLORATION [J].
GERARD, P ;
DENEUVILLE, A ;
COURTHS, R .
THIN SOLID FILMS, 1980, 71 (02) :221-236
[10]   REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J].
HELLER, J .
THIN SOLID FILMS, 1973, 7 (02) :163-176