EFFECT OF COLLECTOR BIASING ON CURRENT DISTRIBUTION IN DC DIODE SPUTTERING DISCHARGE

被引：3

作者：

CHRISTEN.O ^{[1
]}

KLEIN, BJ ^{[1
]}

机构：

[1] CNRS,LAB PHYS MATERIAUX,92 BELLEVUE,FRANCE

来源：

JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1974年 / 7卷 / 04期

关键词：

D O I：

10.1088/0022-3735/7/4/014

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：261 / 266

页数：6

共 10 条

[1]

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[2]

MAISSEL LI, 1970, HDB THIN FILM TECHNO, pCH4

[3]

POMPEI J, 1969, 1 P EUR SPUTT S TOUL, P91

[4] DISTRIBUTION OF MATERIAL SPUTTERED FROM A DISK ELECTRODE [J].

SCHWARTZ, GC ;

JONES, RE ;

MAISSEL, LI .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (03) :351-&

[5]

VONENGELL A, 1965, IONIZED GASES

[6] CONTROL OF FILM PROPERTIES BY RF-SPUTTERING TECHNIQUES [J].

VOSSEN, JL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (05) :S12-+

[7]

VOSSEN JL, 1968, RCA REV, V29, P566

[8]

WEHNER GK, 1970, HDB THIN FILM TECHNO, pCH3

WINTERS, HF ;

KAY, E .

[10]

WINTERS HF, 1971, J VAC SCI TECHNOL, V8, P17, DOI 10.1116/1.1316280