ANALYSIS OF COATING INTERLAYER BETWEEN SILICON-NITRIDE CUTTING TOOLS AND TITANIUM CARBIDE AND TITANIUM NITRIDE COATINGS

被引:20
作者
BHAT, DG [1 ]
REBENNE, HE [1 ]
STRANDBERG, C [1 ]
机构
[1] GTE LABS INC,WALTHAM,MA 02254
关键词
D O I
10.1007/BF00612391
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Silicon nitride (Si3N4) cutting tools exhibit excellent thermal stability and wear resistance in the high-speed machining of cast irons, but show poor chemical wear resistance in the machining of steel. Conventional chemical vapour deposition (CVD) coating of Si3N4 tools has not been very successful because of thermal expansion mismatch between coatings and the substrate. This problem was overcome by developing a CVD process to tailor the interface for titanium carbide (TiC) and titanium nitride (TiN) coatings. Computer modelling of the CVD process was done to predict which phases would form at the interface, and the results compared with analyses of the interface. Three Si3N4 compositions were considered, including pure Si3N4, Si3N4 with a glass phase binder, and Si3N4 + TiC composite with a glass phase binder. Results of machining tests on coated tools show that the formation of an interlayer provides superior wear resistance and tool life in the machining of steel as compared to uncoated and conventionally coated Si3N4 tools.
引用
收藏
页码:4567 / 4580
页数:14
相关论文
共 19 条
  • [1] BALDONI JG, 1988, CERAM B, V67, P381
  • [2] BHAT DG, 1987, Patent No. 4640693
  • [3] BHAT PG, 1987, Patent No. 4670024
  • [4] BURDEN SJ, 1987, Patent No. 4652276
  • [5] EZIS A, 1984, Patent No. 4434238
  • [6] PHYSICAL-PROPERTIES AND CUTTING PERFORMANCE OF SILICON-NITRIDE CERAMIC
    FUKUHARA, M
    FUKAZAWA, K
    FUKAWA, A
    [J]. WEAR, 1985, 102 (03) : 195 - 210
  • [7] FURUKAWA M, 1982, NIPPON TUNGSTEN REV, V15, P1
  • [8] GORDON S, 1976, NASA SP273
  • [9] REACTION BETWEEN REACTION-BONDED SI3N4 AND TITANIUM THIN-FILMS
    KAGAWA, Y
    [J]. JOURNAL OF MATERIALS SCIENCE LETTERS, 1985, 4 (09) : 1062 - 1066
  • [10] TIC AND TIN COATINGS FORMED ON SI3N4-TIC COMPOSITE CERAMICS BY CHEMICAL VAPOR-DEPOSITION
    KIM, DW
    PARK, YJ
    LEE, JG
    CHUN, JS
    [J]. THIN SOLID FILMS, 1988, 165 (01) : 149 - 161