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SEMICONDUCTOR-DEVICES FOR WT4 REPEATER
被引:2
作者
:
DUNN, CN
论文数:
0
引用数:
0
h-index:
0
DUNN, CN
PETERSEN, OG
论文数:
0
引用数:
0
h-index:
0
PETERSEN, OG
REDLINE, DC
论文数:
0
引用数:
0
h-index:
0
REDLINE, DC
机构
:
来源
:
BELL SYSTEM TECHNICAL JOURNAL
|
1977年
/ 56卷
/ 10期
关键词
:
D O I
:
10.1002/j.1538-7305.1977.tb00172.x
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:2119 / 2134
页数:16
相关论文
共 22 条
[1]
AXELING GS, COMMUNICATION
[2]
PLANAR ISOLATED GAAS DEVICES PRODUCED BY MOLECULAR-BEAM EPITAXY
BALLAMY, WC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,READING,PA 19604
BALLAMY, WC
CHO, AY
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,READING,PA 19604
CHO, AY
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1976,
23
(04)
: 481
-
484
[3]
REGENERATIVE REPEATERS
BARNES, CE
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
BARNES, CE
BROSTRUPJENSEN, P
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
BROSTRUPJENSEN, P
HARKLESS, ET
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
HARKLESS, ET
MUISE, RW
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
MUISE, RW
NARDI, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
NARDI, AJ
[J].
BELL SYSTEM TECHNICAL JOURNAL,
1977,
56
(10):
: 2055
-
2075
[4]
OPTIMIZATION OF DIODE STRUCTURES FOR MONOLITHIC INTEGRATED MICROWAVE CIRCUITS
BATTERSHALL, BW
论文数:
0
引用数:
0
h-index:
0
机构:
Texas Instruments Incorporated, Dallas, Tex.
BATTERSHALL, BW
EMMONS, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Texas Instruments Incorporated, Dallas, Tex.
EMMONS, SP
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1968,
SC 3
(02)
: 107
-
+
[5]
BOSCH F, 1977, JUN IEEE MTTS INT MI
[6]
CHO AY, 1975, J APPL PHYS, V46
[7]
CLEMETSO.WJ, 1971, AT&T TECH J, V50, P2917
[8]
CURBY RC, 1976, FEB IEEE INT SOL STA
[9]
DUNN CN, 1973, IEDM DIGEST DEC, P486
[10]
SILICON EPITAXIAL WAFER WITH ABRUPT INTERFACE BY 2-STEP EPITAXIAL-GROWTH TECHNIQUE
ISHII, T
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
ISHII, T
KONDO, A
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
KONDO, A
SHIRAHATA, K
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
SHIRAHATA, K
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(11)
: 1523
-
1531
←
1
2
3
→
共 22 条
[1]
AXELING GS, COMMUNICATION
[2]
PLANAR ISOLATED GAAS DEVICES PRODUCED BY MOLECULAR-BEAM EPITAXY
BALLAMY, WC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,READING,PA 19604
BALLAMY, WC
CHO, AY
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,READING,PA 19604
CHO, AY
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1976,
23
(04)
: 481
-
484
[3]
REGENERATIVE REPEATERS
BARNES, CE
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
BARNES, CE
BROSTRUPJENSEN, P
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
BROSTRUPJENSEN, P
HARKLESS, ET
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
HARKLESS, ET
MUISE, RW
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
MUISE, RW
NARDI, AJ
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC, COAXIAL SYST PHYS DESIGN GRP, MURRAY HILL, NJ 07974 USA
NARDI, AJ
[J].
BELL SYSTEM TECHNICAL JOURNAL,
1977,
56
(10):
: 2055
-
2075
[4]
OPTIMIZATION OF DIODE STRUCTURES FOR MONOLITHIC INTEGRATED MICROWAVE CIRCUITS
BATTERSHALL, BW
论文数:
0
引用数:
0
h-index:
0
机构:
Texas Instruments Incorporated, Dallas, Tex.
BATTERSHALL, BW
EMMONS, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Texas Instruments Incorporated, Dallas, Tex.
EMMONS, SP
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1968,
SC 3
(02)
: 107
-
+
[5]
BOSCH F, 1977, JUN IEEE MTTS INT MI
[6]
CHO AY, 1975, J APPL PHYS, V46
[7]
CLEMETSO.WJ, 1971, AT&T TECH J, V50, P2917
[8]
CURBY RC, 1976, FEB IEEE INT SOL STA
[9]
DUNN CN, 1973, IEDM DIGEST DEC, P486
[10]
SILICON EPITAXIAL WAFER WITH ABRUPT INTERFACE BY 2-STEP EPITAXIAL-GROWTH TECHNIQUE
ISHII, T
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
ISHII, T
KONDO, A
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
KONDO, A
SHIRAHATA, K
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LABS, 80 NAKANO, AMAGASAKI 661, HYOGO, JAPAN
SHIRAHATA, K
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(11)
: 1523
-
1531
←
1
2
3
→