CONTROLLED ETCHING OF SILICON IN THE HF-HNO3 SYSTEM

[1] BUCK TM, 1960, SURFACE CHEMISTRY ME, P107

[2] DEWALD JF, 1959, SEMICONDUCTORS, P733

[3] FEUILLADE MG, 1959, ECHO RECHERCHES, V36, P27

[4] DIFFUSION OF DONOR AND ACCEPTOR ELEMENTS IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1956, 27 (05) : 544 - 553

[5] Voltammetric determinations and amperometric titrations with a rotating microelectrode of platinum wire [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1941, 45 (07) : 1079 - 1093

[6] Voltammetry with stationary microelectrodes of platinum wire [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1941, 45 (07) : 1061 - 1079

[7] CHEMICAL ETCHING OF SILICON .3. A TEMPERATURE STUDY IN THE ACID SYSTEM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (04) : 365 - 372

[8] ON THE MECHANISM OF CHEMICALLY ETCHING GERMANIUM AND SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (10) : 810 - 816

[9] WANG P, 1958, SYLVANIA TECH, V11, P50

[1] BUCK TM, 1960, SURFACE CHEMISTRY ME, P107

[2] DEWALD JF, 1959, SEMICONDUCTORS, P733

[3] FEUILLADE MG, 1959, ECHO RECHERCHES, V36, P27

[4] DIFFUSION OF DONOR AND ACCEPTOR ELEMENTS IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1956, 27 (05) : 544 - 553

[5] Voltammetric determinations and amperometric titrations with a rotating microelectrode of platinum wire [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1941, 45 (07) : 1079 - 1093

[6] Voltammetry with stationary microelectrodes of platinum wire [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1941, 45 (07) : 1061 - 1079

[7] CHEMICAL ETCHING OF SILICON .3. A TEMPERATURE STUDY IN THE ACID SYSTEM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (04) : 365 - 372

[8] ON THE MECHANISM OF CHEMICALLY ETCHING GERMANIUM AND SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (10) : 810 - 816

[9] WANG P, 1958, SYLVANIA TECH, V11, P50