THE DEVELOPMENT OF STANDARDS FOR SURFACE-ANALYSIS

[1] RESULTS OF A TA2O5 SPUTTER YIELD ROUND ROBIN [J]. SURFACE AND INTERFACE ANALYSIS, 1981, 3 (06) : 240 - 242

[2] DENCH WA, IN PRESS

[3] ERICKSON NE, IN PRESS

[4] GENERAL-ASPECTS OF TRACE ANALYTICAL METHODS .8. DISTRIBUTION ANALYSIS OF MAJOR AND TRACE-ELEMENTS THROUGH SEMICONDUCTOR LAYERS OF CHANGING MATRIX USING SECONDARY ION MASS-SPECTROMETRY (SIMS) [J]. PURE AND APPLIED CHEMISTRY, 1987, 59 (02) : 229 - 244

[5] GENERAL-ASPECTS OF TRACE ANALYTICAL METHODS .7. TRACE ANALYSIS OF SEMICONDUCTOR-MATERIALS .B. DISTRIBUTION ANALYSIS [J]. PURE AND APPLIED CHEMISTRY, 1985, 57 (08) : 1153 - 1170

[6] NOMENCLATURE, SYMBOLS AND UNITS RECOMMENDED FOR INSITU MICROANALYSIS [J]. PURE AND APPLIED CHEMISTRY, 1983, 55 (12) : 2023 - 2027

[7] PRACTICAL SURFACE-ANALYSIS - STATE-OF-THE-ART AND RECENT DEVELOPMENTS IN AES, XPS, ISS AND SIMS [J]. SURFACE AND INTERFACE ANALYSIS, 1986, 9 (1-6) : 3 - 20

[8] STATUS-REPORT ON ASTM E-42 COMMITTEE ON SURFACE-ANALYSIS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (03): : 1570 - 1573

[9] HOLLOWAY PH, 1982, SURF INTERFACE ANAL, V4, pR3, DOI 10.1002/sia.740040309

[10] AES AND XPS DEPTH PROFILING CERTIFIED REFERENCE MATERIAL [J]. SURFACE AND INTERFACE ANALYSIS, 1984, 6 (02) : 92 - 93

[1] RESULTS OF A TA2O5 SPUTTER YIELD ROUND ROBIN [J]. SURFACE AND INTERFACE ANALYSIS, 1981, 3 (06) : 240 - 242

[2] DENCH WA, IN PRESS

[3] ERICKSON NE, IN PRESS

[4] GENERAL-ASPECTS OF TRACE ANALYTICAL METHODS .8. DISTRIBUTION ANALYSIS OF MAJOR AND TRACE-ELEMENTS THROUGH SEMICONDUCTOR LAYERS OF CHANGING MATRIX USING SECONDARY ION MASS-SPECTROMETRY (SIMS) [J]. PURE AND APPLIED CHEMISTRY, 1987, 59 (02) : 229 - 244

[5] GENERAL-ASPECTS OF TRACE ANALYTICAL METHODS .7. TRACE ANALYSIS OF SEMICONDUCTOR-MATERIALS .B. DISTRIBUTION ANALYSIS [J]. PURE AND APPLIED CHEMISTRY, 1985, 57 (08) : 1153 - 1170

[6] NOMENCLATURE, SYMBOLS AND UNITS RECOMMENDED FOR INSITU MICROANALYSIS [J]. PURE AND APPLIED CHEMISTRY, 1983, 55 (12) : 2023 - 2027

[7] PRACTICAL SURFACE-ANALYSIS - STATE-OF-THE-ART AND RECENT DEVELOPMENTS IN AES, XPS, ISS AND SIMS [J]. SURFACE AND INTERFACE ANALYSIS, 1986, 9 (1-6) : 3 - 20

[8] STATUS-REPORT ON ASTM E-42 COMMITTEE ON SURFACE-ANALYSIS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (03): : 1570 - 1573

[9] HOLLOWAY PH, 1982, SURF INTERFACE ANAL, V4, pR3, DOI 10.1002/sia.740040309

[10] AES AND XPS DEPTH PROFILING CERTIFIED REFERENCE MATERIAL [J]. SURFACE AND INTERFACE ANALYSIS, 1984, 6 (02) : 92 - 93