SOME ASPECTS OF AUGER MICROANALYSIS

The physical basis of high resolution Auger microanalysis is described. The small electron beam sizes needed (∼ 100 nm) are obtained by using high brightness electron guns at relatively high voltages. The influence of primary beam energy on cross-section, backscattering factor and resolution is examined. Other electron beam induced processes at the surface as dissociation and desorption are also considered. An analysis is made of the limitations for a quantitative Auger microanalysis. Two examples are given illustrating in-depth profiling at high lateral resolution and crater edge profiling. © 1979.