HIGH-EFFICIENCY SUBWAVELENGTH DIFFRACTIVE OPTICAL-ELEMENT IN GAAS FOR 975 NM

被引:44
作者
WARREN, ME
SMITH, RE
VAWTER, GA
WENDT, JR
机构
[1] Sandia National Laboratories, Albuquerque, NM
关键词
D O I
10.1364/OL.20.001441
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We have fabricated subwavelength diffractive optical elements with binary phase profiles for operation at 975 nm. The individual surface-relief features of the elements are smaller than the wavelength of light in the material. By modulating the size and spacing of the features we form artificial, gradient, effective index-of-refraction surfaces. The blazed transmission gratings were designed with rigorous coupled-wave analysis and fabricated by direct-write electron-beam lithography and reactive ion-beam etching in GaAs. The gratings have minimum features 63 nm wide. Transmission measurements show 85% diffraction efficiency into the first order.
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页码:1441 / 1443
页数:3
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