SPUN ON ARSENOSILICA FILMS AS SOURCES FOR SHALLOW ARSENIC DIFFUSIONS WITH HIGH SURFACE CONCENTRATION

被引：23

作者：

REINDL, K ^{[1
]}

机构：

[1] TEXAS INSTR DEUTSCHLAND GMBH,FREISING 805,WEST GERMANY

来源：

SOLID-STATE ELECTRONICS | 1973年 / 16卷 / 02期

关键词：

D O I：

10.1016/0038-1101(73)90028-2

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

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页码：181 / &

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