STRUCTUAL CHANGES OF ARSENIC SILICATE GLASSES WITH HEAT TREATMENTS

[1] ADAMS RV, 1961, PHYS CHEM GLASSES-B, V2, P101

[2] THERMODYNAMICS OF ARSENIC IN GLASS [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1959, 42 (01) : 27 - 29

[3] BELL T, 1962, PHYS CHEM GLASSES-B, V3, P141

[4] GAMMA-INDUCED ABSORPTION AND STRUCTURAL STUDIES OF ARSENIC BORATE GLASSES [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1966, 49 (08) : 423 - &

[5] Burger R M, 1967, FUNDAMENTALS SILICON, V1

[6] CRANK J, 1956, MATHEMATICS DIFFUSIO

[7] DIFFUSION OF DONOR AND ACCEPTOR ELEMENTS IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1956, 27 (05) : 544 - 553

[8] REDISTRIBUTION OF ACCEPTOR + DONOR IMPURITIES DURING THERMAL OXIDATION OF SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) : 2695 - &

[9] Kubaschewski O, 1951, METALLURGICAL THERMO

[10] DIFFUSION INTO SILICON FROM AN ARSENIC-DOPED OXIDE [J]. SOLID-STATE ELECTRONICS, 1967, 10 (06) : 623 - &

[1] ADAMS RV, 1961, PHYS CHEM GLASSES-B, V2, P101

[2] THERMODYNAMICS OF ARSENIC IN GLASS [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1959, 42 (01) : 27 - 29

[3] BELL T, 1962, PHYS CHEM GLASSES-B, V3, P141

[4] GAMMA-INDUCED ABSORPTION AND STRUCTURAL STUDIES OF ARSENIC BORATE GLASSES [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1966, 49 (08) : 423 - &

[5] Burger R M, 1967, FUNDAMENTALS SILICON, V1

[6] CRANK J, 1956, MATHEMATICS DIFFUSIO

[7] DIFFUSION OF DONOR AND ACCEPTOR ELEMENTS IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1956, 27 (05) : 544 - 553

[8] REDISTRIBUTION OF ACCEPTOR + DONOR IMPURITIES DURING THERMAL OXIDATION OF SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) : 2695 - &

[9] Kubaschewski O, 1951, METALLURGICAL THERMO

[10] DIFFUSION INTO SILICON FROM AN ARSENIC-DOPED OXIDE [J]. SOLID-STATE ELECTRONICS, 1967, 10 (06) : 623 - &