CRYSTALLIZATION OF LPCVD SILICON FILMS BY LOW-TEMPERATURE ANNEALING

被引：95

作者：

AOYAMA, T

KAWACHI, G

KONISHI, N

SUZUKI, T

OKAJIMA, Y

MIYATA, K

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 04期

关键词：

D O I：

10.1149/1.2096829

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

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页码：1169 / 1173

页数：5

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