CRYSTALLIZATION OF LPCVD SILICON FILMS BY LOW-TEMPERATURE ANNEALING

被引:95
作者
AOYAMA, T
KAWACHI, G
KONISHI, N
SUZUKI, T
OKAJIMA, Y
MIYATA, K
机构
关键词
D O I
10.1149/1.2096829
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1169 / 1173
页数:5
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