THE EFFECT OF EXTRA DOSES AT THE PATTERN EDGES ON NEGATIVE ELECTRON RESIST PROFILES

被引：6

作者：

NAKATA, H ^{[1
]}

KATO, T ^{[1
]}

MURATA, K ^{[1
]}

HIRAI, Y ^{[1
]}

NAGAMI, K ^{[1
]}

机构：

[1] UNIV OSAKA PREFECTURE,DEPT ELECTR,SAKAI,OSAKA 591,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571254

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1248 / 1253

页数：6

共 6 条

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[3] ELECTRON-SCATTERING AND LINE-PROFILES IN NEGATIVE ELECTRON RESISTS [J].

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[4] CROSS-SECTION PROFILES OF SINGLE-SCAN NEGATIVE ELECTRON-RESIST LINES [J].

LIN, LH .

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[5] EXPERIMENTAL AND THEORETICAL-STUDY OF CROSS-SECTIONAL PROFILES OF RESIST PATTERNS IN ELECTRON-BEAM LITHOGRAPHY [J].

MURATA, K ;

NOMURA, E ;

NAGAMI, K ;

KATO, T ;

NAKATA, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1734-1738

[6] MOLECULAR PARAMETERS AND LITHOGRAPHIC PERFORMANCE OF POLY(GLYCIDYL METHACRYLATE-CO-ETHYL ACRYLATE) - NEGATIVE ELECTRON RESIST [J].

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FEIT, ED .

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