EXPERIMENTAL AND THEORETICAL-STUDY OF CROSS-SECTIONAL PROFILES OF RESIST PATTERNS IN ELECTRON-BEAM LITHOGRAPHY

被引:17
作者
MURATA, K [1 ]
NOMURA, E [1 ]
NAGAMI, K [1 ]
KATO, T [1 ]
NAKATA, H [1 ]
机构
[1] MITSUBISHI ELECT CORP,LSI DEV LAB,ITAMI,HYOGO,JAPAN
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期
关键词
D O I
10.1116/1.570283
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1734 / 1738
页数:5
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