EXPERIMENTAL AND THEORETICAL-STUDY OF CROSS-SECTIONAL PROFILES OF RESIST PATTERNS IN ELECTRON-BEAM LITHOGRAPHY

被引：17

作者：

MURATA, K ^{[1
]}

NOMURA, E ^{[1
]}

NAGAMI, K ^{[1
]}

KATO, T ^{[1
]}

NAKATA, H ^{[1
]}

机构：

[1] MITSUBISHI ELECT CORP,LSI DEV LAB,ITAMI,HYOGO,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570283

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1734 / 1738

页数：5

共 10 条

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[5]

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[6] MONTE-CARLO SIMULATION OF SPATIALLY DISTRIBUTED BEAMS IN ELECTRON-BEAM LITHOGRAPHY [J].

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[7]

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[8] REMARKS ON CALCULATION OF ENERGY-LOSS IN ELECTRON-RESIST FILMS ON SUBSTRATES [J].

MURATA, K ;

KOTERA, M ;

NAGAMI, K .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (09) :1671-1672

[9] ELECTRON-BEAM RESIST EDGE PROFILE SIMULATION [J].

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[10]

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