X-RAY-LITHOGRAPHY MASK TECHNOLOGY

被引:9
作者
BUCKLEY, WD
NESTER, JF
WINDISCHMANN, H
机构
关键词
D O I
10.1149/1.2127562
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1116 / 1120
页数:5
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