LOW-TEMPERATURE EPITAXY OF GE FILMS BY SPUTTER DEPOSITION

被引：10

作者：

KHAN, IH ^{[1
]}

机构：

[1] NASA,AMES RES CTR,MOFFETT FIELD,CA 94035

来源：

关键词：

D O I：

10.1063/1.1661849

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：14 / 19

页数：6

共 8 条

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BROGAN, WT .

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[3] EPITAXY OF GERMANIUM FILMS ON GERMANIUM BY VACUUM EVAPORATION [J].

DAVEY, JE .

[4]

KRIKORIAN E, 1966, J APPL PHYS, V37, P3365

[5]

LAYTON CK, 1967, THIN SOLID FILMS, V1, P169

[6]

ROBERTSON WD, 1971, J VAC SCI TECHNOL, V8, P406

[7] THERMAL RESTORATION OF OXYGENATED GERMANIUM SURFACES [J].

ROSENBERG, AJ ;

ROBINSON, PH ;

GATOS, HC .

[8] LOW-PRESSURE SPUTTERED GERMANIUM FILMS [J].

WOLSKY, SP ;

PIWKOWSK.TR ;

WALLIS, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1965, 2 (03) :97-&