SOME FACTORS CONTROLLING GROSS LEAKAGE CURRENTS IN SPUTTERED TANTALUM-FILM CAPACITORS

被引：13

作者：

SILCOX, NW

MAISSEL, LI

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1962年 / 109卷 / 12期

关键词：

D O I：

10.1149/1.2425262

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：1151 / 1154

页数：4

相关论文

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[2] The deposition of sputtered films
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[J]. PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, 1917, 3 : 141 - 147
[4] RUSCETTA, 1956, Patent No. 2739110
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