DEPTH PROFILING BY SECONDARY ION MASS-SPECTROMETRY

被引：70

作者：

ZINNER, E ^{[1
]}

机构：

[1] WASHINGTON UNIV,DEPT PHYS,ST LOUIS,MO 63130

来源：

SCANNING | 1980年 / 3卷 / 02期

关键词：

D O I：

10.1002/sca.4950030202

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：57 / 78

页数：22

共 238 条

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[4]

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[5]

ANDERSEN CA, 1969, INT J MASS SPECTROM, V2, P61

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[9]

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[10] SECONDARY ION MASS-SPECTROMETRY DEPTH PROFILING AND SIMULTANEOUS ELECTRICAL INVESTIGATION OF MOS STRUCTURES [J].

BARSONY, I ;

MARTON, D ;

GIBER, J .

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