EFFECTS OF ION-IMPLANTATION ON SUBSTRATE HARDENING AND FILM STRESS REDUCTION AND THEIR EFFECT ON YIELD OF BIPOLAR-TRANSISTORS

被引：15

作者：

HU, SM

SCHWENKER, RO

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1978年 / 49卷 / 06期

关键词：

D O I：

10.1063/1.325274

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3259 / 3265

页数：7

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