DEPOSITION OF NANOCRYSTALS ON FLAT SUPPORTS BY SPIN-COATING

被引：72

作者：

KUIPERS, EW

LASZLO, C

WIELDRAAIJER, W

机构：

[1] Koninklijke/Shell-Laboratorium Amsterdam (Shell Research B. V.), CM Amsterdam, 1031

来源：

CATALYSIS LETTERS | 1993年 / 17卷 / 1-2期

关键词：

IMPREGNATION; MODEL; CATALYST; PREPARATION; SPIN-COATING; MICROSCOPY;

D O I：

10.1007/BF00763929

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Monodisperse particles can be evenly distributed over flat supports by ''spin-impregnation''. In this way Cu precursors have been deposited onto Si wafers. The effects of the rotation frequency and the concentration of the ''impregnation'' solution have been investigated. The mean diameter of the deposited particles can be varied from several nanometers upto several micrometers as is shown by microscopy images. ''Spin-impregnation'' appears a useful tool to prepare well-defined flat model catalysts, which are readily accessible both to quantitative characterisation and to catalytic testing.

引用

页码：71 / 79

页数：9

共 9 条

[1] FLOW OF A VISCOUS LIQUID ON A ROTATING DISK [J].