FUNDAMENTAL DIFFERENCES BETWEEN THICK AND THIN OXIDES SUBJECTED TO HIGH ELECTRIC-FIELDS

被引：25

作者：

WARREN, WL

LENAHAN, PM

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 10期

关键词：

D O I：

10.1063/1.339110

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4305 / 4308

页数：4

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