STUDY OF SILICON-SILICON DIOXIDE STRUCTURE BY ELECTRON-SPIN RESONANCE .2.

被引：85

作者：

NISHI, Y

OHWADA, A

TANAKA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1972年 / 11卷 / 01期

关键词：

D O I：

10.1143/JJAP.11.85

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：85 / &

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