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DEPOSITION OF OPTICAL COATINGS BY LASER-ASSISTED EVAPORATION AND BY PHOTO-ASSISTED CHEMICAL VAPOR-DEPOSITION

被引：14
作者：
SANKUR, H
机构：
[1] Rockwell Science Center, Thousand Oaks, CA 91360
来源：
THIN SOLID FILMS | 1992年 / 218卷 / 1-2期
关键词：
D O I：
10.1016/0040-6090(92)90915-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this paper two optical coating techniques that utilize photons, laser-assisted evaporation and photo-assisted chemical vapor deposition (photo-CVD), are reviewed. Laser-assisted evaporation can produce high quality thin films and can be used advantageously to reproduce the stoichiometry of source materials of multielement compounds. Photo-CVD is a deposition technique that can be used to coat large area substrates and selectively small areas of a substrate. Both techniques are amenable for low substrate temperature deposition.
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页码：161 / 169
页数：9
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