X-RAY MEASUREMENTS OF STRESS IN THIN SINGLE-CRYSTAL SILICON FILMS

被引:10
作者
KAMINS, TI [1 ]
MEIERAN, ES [1 ]
机构
[1] FAIRCHILD CAMERA & INSTR CORP, RES & DEV LAB, PALO ALTO, CA 94304 USA
关键词
D O I
10.1063/1.1662089
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:5064 / 5066
页数:3
相关论文
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