CHARACTERISTICS OF PIEZOELECTRIC ZNO FILMS DEPOSITED BY RF MODE ELECTRON-CYCLOTRON RESONANCE SPUTTERING SYSTEM

被引：4

作者：

KADOTA, M ^{[1
]}

KASANAMI, T ^{[1
]}

MINAKATA, M ^{[1
]}

机构：

[1] TOHOKU UNIV,SENDAI,MIYAGI 980,JAPAN

来源：

ELECTRONICS LETTERS | 1992年 / 28卷 / 25期

关键词：

THIN FILMS; SURFACE ACOUSTIC WAVE DEVICES; PIEZOELECTRIC DEVICES AND MATERIALS;

D O I：

10.1049/el:19921490

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Piezoelectric ZnO films on glass substrate were deposited by an RF mode ECR sputtering system. It was confirmed that in the ZnO films deposited by this system, a smooth sidewall structure of ZnO film without coarse columnar (fibre) grains was observed and that driving a 1.1 GHz fundamental mode of a Rayleigh SAW on ZnO/IDT/glass structure was possible at lambda = 2.4 mum.

引用

页码：2315 / 2317

页数：3

共 8 条

[1]

CHUBACHI N, 1974, JPN J APPL PHYS PT 1, V13, P737

[2]

HICKERNELL FS, 1980, IEEE ULTR S, P785

[3]

HICKERNELL FS, 1991, 1ST P INT S SPUTT PL, P57

[4] THE POLISHING EFFECT OF ZNO THIN-FILMS ON SAW FILTERS [J].

KADOTA, M ;

KONDO, C ;

IKEDA, T ;

KASANAMI, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 :159-161

[5] PIEZOELECTRIC CHARACTERISTICS OF ZNO FILMS DEPOSITED USING AN ELECTRON-CYCLOTRON RESONANCE SPUTTERING SYSTEM [J].

KADOTA, M ;

KASANAMI, T ;

MINAKATA, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (9B) :3013-3016

[6] REACTIVE ION-BEAM ETCHING USING A BROAD BEAM ECR ION-SOURCE [J].

MATSUO, S ;

ADACHI, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (01) :L4-L6

[7]

YAMAMOTO T, 1980, J APPL PHYS, V51, P3133

[8]

YOSHINO Y, 1987, 8TH P INT S PLASM CH, V4, P2271

← 1 →