KRF LASER PHOTOABLATION OF A GRAPHITE TARGET - APPLICATION TO THE DEVELOPMENT OF THIN-FILMS

被引：15

作者：

GERMAIN, C

GIRAULT, C

GISBERT, R

AUBRETON, J

CATHERINOT, A

机构：

[1] URA no. 320, CNRS Laboratoire de Matériaux Céramiques et Traitements de Surfaces, UFR des Sciences, 87060 Limoges

来源：

关键词：

D O I：

10.1016/0925-9635(94)90232-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The plasma plume created above a graphite target irradiated by a KrF laser beam (248 nm) has been investigated using three experimental methods: ion detection, time and spatially resolved emission spectroscopy and double Langmuir probe. Measurements give information on the energetic distribution of ionic species, on the kinetic temperature of the gas and on the electronic density of the plasma plume. Carbon thin films have been deposited on silicon substrates: for high fluence values (above 1000 J cm-2) and low temperature (30-degrees-C), the films are harder than c-BN, their refractive index is 2.4, and XPS analysis gives spectra with a high sp3 configuration.

引用

页码：598 / 601

页数：4

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