PROPERTIES OF THE NB THIN-FILM NANOBRIDGES PREPARED BY NANOMETER FABRICATION PROCESS

被引：3

作者：

HARADA, Y

HIROSE, N

UZAWA, Y

SEKINE, M

机构：

[1] IBARAKI UNIV,DEPT ELECT & ELECTR ENGN,HITACHI 316,JAPAN

[2] CRL KANSAI ADV RES CTR,NISHI KU,KOBE 674,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 12B期

关键词：

NB; THIN-FILM NANOBRIDGE; NANOFABRICATION PROCESS; NEW EB RESIST; SHAPIRO STEP; SERIES ARRAY;

D O I：

10.1143/JJAP.30.3933

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We describe the properties of Nb thin-film nanobridges fabricated by means of our original nanometer-scale process. Our original nanofabrication techniques include the synthesis of a new electron beam (EB) resist and the use of CBrF3 as an etchant for reactive ion etching (RIE). Fabricated nanobridges have high sensitivity of radiation and high reliability. It is observed that the properties of nanobridges can be changed by varying the bridge length and its thickness. We have also fabricated the series arrays and observed that they operate coherently.

引用

页码：3933 / 3937

页数：5

共 16 条

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