MULTILEVEL RESIST FOR LITHOGRAPHY BELOW 100-NM

被引：32

作者：

HOWARD, RE

HU, EL

JACKEL, LD

机构：

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1981年 / 28卷 / 11期

关键词：

D O I：

10.1109/T-ED.1981.20617

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1378 / 1381

页数：4

共 16 条

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[8] 400-A LINEWIDTH E-BEAM LITHOGRAPHY ON THICK SILICON SUBSTRATES [J].

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[10] ULTRA-SMALL SUPERCONDUCTING TUNNEL-JUNCTIONS [J].

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IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (10) :2030-2031

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