SIMULTANEOUS THIN-FILM STRESS AND MASS-CHANGE MEASUREMENTS USING QUARTZ RESONATORS

[1] [Anonymous], 1949, P IRE, V37, P1378

[2] BLEWER RS, PERSONAL COMMUNICATI

[3] PURE MODES FOR ELASTIC WAVES IN CRYSTALS [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (3P1) : 759 - +

[4] SPUTTERING AND STRAIN OF SILICON BY ION IMPLANTATION [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (01) : 480 - &

[5] SENSITIVE TECHNIQUE FOR STUDYING ION-IMPLANTATION DAMAGE [J]. APPLIED PHYSICS LETTERS, 1971, 18 (12) : 581 - &

[6] Hoffman R. W., 1966, PHYS THIN FILMS, VVol. 3, pp. 211

[7] MASON WP, 1950, PIEZOELECTRIC CRYSTA, P78

[8] ELASTIC MODULI OF QUARTZ VERSUS HYDROSTATIC PRESSURE AT 25 DEGREES AND -195.8 DEGREES C [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (05) : 1624 - &

[9] NYE JF, 1969, PHYSICAL PROPERTIES, P43

[10] STOCKBRIDGE CD, 1966, VACUUM MICROBALANCE, V5, P179

[1] [Anonymous], 1949, P IRE, V37, P1378

[2] BLEWER RS, PERSONAL COMMUNICATI

[3] PURE MODES FOR ELASTIC WAVES IN CRYSTALS [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (3P1) : 759 - +

[4] SPUTTERING AND STRAIN OF SILICON BY ION IMPLANTATION [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (01) : 480 - &

[5] SENSITIVE TECHNIQUE FOR STUDYING ION-IMPLANTATION DAMAGE [J]. APPLIED PHYSICS LETTERS, 1971, 18 (12) : 581 - &

[6] Hoffman R. W., 1966, PHYS THIN FILMS, VVol. 3, pp. 211

[7] MASON WP, 1950, PIEZOELECTRIC CRYSTA, P78

[8] ELASTIC MODULI OF QUARTZ VERSUS HYDROSTATIC PRESSURE AT 25 DEGREES AND -195.8 DEGREES C [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (05) : 1624 - &

[9] NYE JF, 1969, PHYSICAL PROPERTIES, P43

[10] STOCKBRIDGE CD, 1966, VACUUM MICROBALANCE, V5, P179