A STUDY ON THE CHARACTERISTICS OF LOW-ENERGY ION-BEAM-ASSISTED DEPOSITION OF TUNGSTEN

被引：2

作者：

KOH, YB ^{[1
]}

GAMO, K ^{[1
]}

机构：

[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 04期

关键词：

ION-BEAM-ASSISTED DEPOSITION (IBAD); HEXACARBONYL TUNGSTEN (W(CO)6); QUADRUPOLE MASS SPECTROMETER; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS);

D O I：

10.1143/JJAP.31.1228

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The characteristics of the low-energy ion-beam-assisted deposition (IBAD) of tungsten films was investigated. Hexacarbonyl tungsten (W(CO)6) and a 0.5 keV Ar+ beam were used for deposition. X-ray photoelectron spectroscopy (XPS) demonstrated that the W(CO)6 adsorbed on the substrate was decomposed and metallic tungsten was formed by ion beam irradiation. Quadrupole mass spectrometer and XPS analyses showed that the CO molecule was mainly dissociated from the W(CO)6. The deposition rate of tungsten films was proportional to the ion current density and the deposition yield was approximately 1.7 atoms/ion. The deposited film consists of approximately 76% tungsten and has a resistivity of approximately 600-mu-OMEGA.cm.

引用

页码：1228 / 1231

页数：4

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