SI-O BOND BREAKING IN SIO2 BY VACUUM ULTRAVIOLET-LASER RADIATION

被引：28

作者：

TAKIGAWA, Y

KUROSAWA, K

SASAKI, W

YOSHIDA, K

FUJIWARA, E

KATO, Y

机构：

[1] OSAKA UNIV,INST LASER ENGN,SUITA,OSAKA 565,JAPAN

[2] UNIV OSAKA PREFECTURE,DEPT ELECTR,SAKAI,OSAKA 591,JAPAN

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1990年 / 116卷 / 2-3期

关键词：

D O I：

10.1016/0022-3093(90)90706-R

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：293 / 296

页数：4

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