INDUSTRIAL CMOS TECHNOLOGY FOR THE INTEGRATION OF OPTICAL METROLOGY SYSTEMS (PHOTO-ASICS)

被引:30
作者
KRAMER, J [1 ]
SEITZ, P [1 ]
BALTES, H [1 ]
机构
[1] SWISS FED INST TECHNOL,PHYS ELECTR LAB,CH-8093 ZURICH,SWITZERLAND
关键词
D O I
10.1016/0924-4247(92)80135-P
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
With 'photo-ASICs' comprising light-sensitive structures, light-emitting devices and analog and digital circuits, complete optical metrology systems can be integrated on a single chip. We report the realization of key components of such photo-ASICs using an industrual IC CMOS process. We achieve photodiodes with an external quantum efficiency of 50-80% in the visible spectrum and position-sensitive devices (PSDs) with a spatial non-linearity of around 0.3%. We demonstrate surface-channel CCDs with a charge-transfer efficiency of 99.8% at room temperature, as well as bucket-brigade devices (BBDs) with a lower charge-transfer efficiency of 96%. Light-emitting diodes (LEDs) are realized, emitting infrared light at 1160 nm (forward biased) and broadband visible yellow light with a spectral maximum at 640 nm (reverse biased). We discuss simple applications of passive photo-ASICs, such as a centroid detector, a 3-D camera, a motion detector and a focus sensor, used to obtain a relative measure for the local focus of an optically imaged scene, for example, in a photographic camera.
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页码:21 / 30
页数:10
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